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June 27-29, 2020
Shanghai New International Expo Centre

Joint Session 13:30-15:20

Sunday, March 15, 2020 Shanghai International Convention Center
Meeting Room:5th Floor Yangtze River Hall

Joint Session: Symposium II and Symposium III-Lithography/Etch
Session Chairs: Kafai Lai & Ying Zhang


13:30-13:35 Opening Remarks
  Kafai Lai / Ying Zhang
**13:35-14:05 TBD
  Shingo Yoshikawa, DNP
**14:05-14:35 Advanced Memory Patterning Challenges and Perspective Solutions
  Jeongdong Choe, DRAM
**14:35-15:05 The Law that Guides the Development of Photolithography Technology and the Methodology in the Design of Photolithographic Process
  Qiang Wu, ICRD
15:05-15:20 Coffee Break