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March 14-16,2018
Shanghai New International Expo Centre

Dr. Hiroshi IWAI

Dr. Hiroshi IWAI
Tokyo Institute of Technology, Japan

Hiroshi Iwai received the B.E. and Ph.D. degrees in electrical engineering from the University of Tokyo and worked in the research and development of integrated circuit technology for more than 25 years in Toshiba. He is now a professor of Frontier Collaborative Research Center and Dept. of Electronics and Applied Physics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama, Japan. Since joining Toshiba, he has developed several generations of high density static RAM's, dynamic RAM's and logic LSI's including CMOS, bipolar, and Bi-CMOS devices. He has also been engaged in research on device physics, process technologies, and T-CAD related to small-geometry MOSFETs and high speed bipolar transistors. He has authored and coauthored more than 600 journal and conference papers.

He has served on many committees of conferences and editors of journals, as well as a member of many evaluation committee of public organizations. For example, the President of the IEEE EDS, an elected member of the IEEE EDS AdCom, an editor of IEEE EDS Newsletter, a guest editor of IEEE Trans. on Electron Devices, and an editor of the Proceedings of ECS Symp. on ULSI Process Integration. He is now the IEEE Division 1 Director for 2010-11. He serves as a visiting professor for many Chinese and Indian universities.

His awards include Local Commendation for Invention from Japan Institute of Invention and Innovation (1990, 2005), Grand Prize of Nikkei BP Technology Awards (1994), IEEE EDS Paul Rappaport Award (1994), IEICE ES Electronics Award (1998), IEEE EDS J.J.Ebers Award (2001), and JSAP Award for the best paper (2002), IEEE BCTM Award (2007), Yamazaki-Teiichi Prize (2007), IEEE 2008 EDS Distinguished Service Award (2008), The Commendation for Science and Technology by the Minister of Education, Culture, Science and Technology, Prizes for Science and Technology, Development Category Award (2009).

His current research interests are Nano CMOS and Emerging Technologies: High–k gate insulator, Si Nanowire MOSFETs, plasma doping for ultra-shallow junctions, Ni salicide, RF CMOS modeling, and Ge transisters.

Dr. Iwai is, a fellow of IEEE, a member of Electrochemical Society, a fellow of the Japan Society Applied Physics, and a fellow of the Institute of Electronics, Information and Communication Engineers of Japan.