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Hidetami Yaegashi is a Senior member of technical staff in Tokyo Electron, and has been working on several aspect of lithography and micro-patterning for over 30 years. He is currently a senior manager of patterning process development in corporate R&D, and have been pursuing integrated patterning solution with 193 immersion ,EUV, resist track, deposition and etching process. He received 2012 best paper award in SPIE Advanced Lithography.
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