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Prof. Jun Luo received the B.S. in Electrochemical Engineering from China University of Geosicencs (Wuhan) in 2002 and M.S. in Material Science and Engineering from Xiamen University in 2005 respectively. He obtained the Ph. D. in Applied Physics and Microelectronics from Royal Institute of Technology (KTH), Sweden in 2010. He is currently a professor at the Institute of Microelectronics, Chinese Academy of Sciences. His research work covers CMOS process and integration, especially in silicides, contact and metallic silicide source/drain devices. He has authored 1 book and more than 100 publications in international peer-reviewed journals and conferences, including Applied Physics Letters, Journal of Applied Physics, IEEE Electron Device Letters, IEEE Transactions on Electron Devices and IEEE IEDM, MAM, ADMETA etc, and holds 60 patents. He severs as the reviewer for several journals and conferences as Applied Physics Letters, Journal of Applied Physics, IEEE Electron Device Letters, Microelectronic Engineering, IEEE Transactions on Electron Devices etc. He is now the deputy chief editor of Journal of Materials Science: Materials in Electronics (JMSE).
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