|
TORU FUJIMORI, is Senior Expert of FUJIFILM Corporation to manage for photo resist development group. He received B.S. and M.S. degrees in organic chemistry from Saitama University, Japan, in 1989 and 1991, respectively. In 1991, he joined FUJIFILM Corporation as a researcher in synthetic organic chemistry laboratories.
He has been studying for synthesizing new materials for photo films for 3 years, and then for semiconductor materials
(photo resist materials) for 8 years. In 2002, He has moved to electronic materials research laboratories to study color resist for image sensor for 6 years. Since 2008, he has been studying photo resist materials for KrF, ArF, ArF immersion, EB and EUV lithography as a research manager. From 2014 to 2016, he was senior researcher at EIDEC (EUVL Infrastructure Development Center, Inc.) as an assignee from FUJIFILM.
He has filed over 200 patents in this field, describe a lot of papers, presentations and chapter of the photo resist text book.
|
