|
|
Dr. Yuyang Sun |
|
Yuyang Sun holds B.Eng and M.Eng from Tianjin University, China and Ph.D from Nanyang Technological University, Singapore. In 2007, Yuyang joined semiconductor industry and started his active work on computational lithography for advanced nodes. He has been working at GLOBALFOUNDIRES R&D on 45nm and 32nm OPC Modeling and later spent three years in IBM Semiconductor Alliance on RET definition for 20nm and 14nm tech-nodes. Yuyang moved to Mentor Graphics in 2013 and now he is working as a technical manager in application engineering team. He is involved in the development of various industry leading EDA solutions for extending the lifetime of optical lithography, including advanced SRAF/OPC solution, double/triple patterning, EUV, DSA, SADP and Design Technology Co-Optimization technology. |
|
