Monday, March 18, 2019 Shanghai International Convention Center
Meeting Room：5th Floor Yangtze River Hall 长江厅

Joint Session: Symposium II and Symposium III-Lithography/Etch
Session Chairs: Kafai Lai & Ying Zhang

13:30-13:35 Opening Remarks
  Kafai Lai & Ying Zhang
**13:35-14:05 Advanced Etch Challenges and Perspective Solutions
  Rich Wise, Lam Research, US
**14:05-14:35 Precise Etching Profile Control by Atomic-Scale Process
  Yoshihide Kihara, TEL, Japan
**14:35-15:05 Boosting Computational Lithography Performance with High Speed Metrology and Machine Learning Technology
  Gary Zhang, ASML-Brion
15:05-15:20 Coffee Break