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Dr. Hitoshi Morinaga
Senior General Manager, New Business Division, FUJIMI Incorporated
Chairman, FUJIMI Shenzhen Technology, Co.,LTD.
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Hitoshi Morinaga is responsible for new business division at FUJIMI Incorporated, Chairman of FUJIMI Shenzhen Technology, and an executive committee member of Planarization and CMP Society, Japan.
Dr. Morinaga received the B.S. degree in industrial chemistry from Tokyo University of Science in 1986, and Ph.D. in electronics from Tohoku University, Japan, in 1995. In 1986-2004, he worked for Mitsubishi Chemical Corporation, Japan, where he has developed various cleaning solutions for semiconductor fabrication (including post CMP cleaners and RCA replacements), and CMP slurries for memory hard disc. In 2005-2006, he was an Associate Professor of Tohoku University, where he was engaged in R&D and systematization of semiconductor wet process technology (including CMP, cleaning, etching and plating) with Prof. Tadahiro Ohmi. In 2006, he joined FUJIMI Incorporated and has been engaged in development of CMP technologies applied for various applications including semiconductor devices, LED, FPD and industrial design. He has over 50 US patents (granted or applied), 150 publications (including invited speeches in international conferences such as ECS, MRS, ICPT, ADMETA, CSTIC, and book chapters regarding semiconductor cleaning or CMP).
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