Gao An 高安
CTO, ADVANCED MICRO OPTICS.INC
CTO，源卓微纳科技（苏州）股份有限公司

讲师简介 / Speaker Bio

Gao An graduated with a bachelor's degree from the Department of Microelectronics at Fudan University in 2008 and obtained his Ph.D. in Applied Physics from the University of Twente in the Netherlands in 2014. From 2010 to 2018, he worked at ASML in the Netherlands, holding positions such as Research Scientist and Technology Manager, where he was involved in the research and development of EUV and DUV lithography machines. Since 2023, he has served as the CTO of Yuanzhuo Micro-nano, focusing on the development of laser direct writing and projection lithography machines. Gao An has extensive expertise in the research and application of lithography technology, particularly excelling in system design and integration technology of lithography machines, photoelectric measurement technology, and contamination control technology. During his career, he has been granted more than ten patents.

摘要 / Abstract

集成电路晶体管的集成密度遵循“每两年翻一倍”的摩尔定律，但目前单个晶体管的平面尺寸缩减趋势逐渐趋缓，与此同时封装技术在不断进步，近几年还开发出chiplet等新技术，。伴随而来的是封装基板互联密度的要求加速增长，光刻设备亟需提高分辨率和Overlay精度。MSS-01是在源卓微纳在投影光刻机产品系列推出的最新机型，主要用于半导体封装及基板光刻工序。凭借多年来与客户一起在IC封装基板行业中积累的经验，以及自主设计的光学系统，在85x85mm曝光视场下实现L/S=1.4um的分辨率，并大幅提高了Overlay精度 ≤0.5um。作为最先进IC封装基板用激光直写光刻机的领先供应商，源卓微纳坚持不断技术革新，并成功推出革新的stepper光刻机产品，我们正用更先进的微纳加工技术改变人类生活。