As technology is scaling down, to develop a high yield manufacturable process become more and more difficult. This panel session will discuss on what are the major yield killers and the key technology solutions to build a reliable 14nm to 7nm logic process. Especially focus on how to solve those difficult issues of high K metal gate, FinFET, ultra-low K BEOL and advanced embedded memory technologies. In this panel, we invite several world renowned exporters to cover thin film, etching, litho, CMP, integration, device, package and circuit design issues to give you a global view of what are those most difficult challenges and what are the solutions to deliver a high yield manufacturable process.
Meeting Room: 3rd Floor Yellow River Hall 黄河厅 Date: March 11, 17:00-18:30 What are the yield killers and the solutions of 14nm to 7nm node technologies? Moderator: Dr. Hsiang-Lan Lung |
Panel Members:
Dr. Huiming Bu | Dr. Rich Wise | Dr. Kafai Lai |
Director, Si Integration and Device, IBM | Managing Director, Lam Research | RSM, Fellow of SPIE and Fellow of OSA, IBM |
|
||
Dr. Ying Zhang | Dr. Min-Hwa Chi | Dr. Owen Hu |
VP of Research, AMAT | Sr. VP, SMIC | Deputy Director, GF |