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David H. Wei holds B.Sc. from Peking University and Ph.D. from McGill University. He has been an industrial scientist and worked in various areas of technology, including fiber-optic communications, optical imaging, nanophotonics, and computational lithography. Dr. Wei is also an avid researcher in fundamental as well as applied physics and mathematics. Currently, he serves as a Sr. Principal Engineer at ASML US, Inc., leading researches in advanced lithography process modeling.
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