Prof. Yayi Wei joined the Institute of Microelectronics, Chinese Academy of Sciences (IMECAS) in 2013. He is now the Director of the Computational Lithography R&D Center and SPIE Fellow, focusing on the computational lithography research for the advanced technology node.
Prof. Wei received his doctorate degree from the Max Planck Institute for Solid State Research/Stuttgart University, and his Ph.D. advisor is the Nobel Prize winner Klaus von Klitzing. Prof. Wei has long been engaged in the research and development of semiconductor devices, materials and processes in the semiconductor lithography field. He led or participated in various projects since 180nm technology node.
Prof. Wei has published more than 70 technical articles and he holds several patents. Due to his great contribution to 193nm immersion lithography, he was invited to publish the book "Advanced Processes for 193nm Immersion Lithography", which is widely used as reference and the graduate textbook. Notably, his monograph "Theory and Application of Advanced Lithography for VLSI" was published in 2016
|
