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March 14-16,2018
Shanghai New International Expo Centre

Yang Meng

Yang Meng
Product Director and Deputy GM of Etch Product Division, Beijing NAURA Microelectronics Equipment Co., Ltd.

Biography

After the completion of his Master degree in Materials Physics and Chemistry in Beihang University in 2003, Yang Meng worked for Beijing NAURA Microelectronics Company from 2003 till now. During the 11 years in the NAURA, he developed multiple commercially successful Plasma Dry Etch products, including 8 inch Si etch product, 12 inch 90/65/40/28 Si etch products, 8 inch deep Si etch product, 8 inch Oxide etch product, 8 inch Metal etch product, etc.

Abstract

随着轨道交通、智能电网、新能源以及汽车和家电行业需求的驱动,功率半导体市场规模增长强劲。相比于传统功率半导体器件,MOSFET、IGBT等Si基功率器件、以及SiC和GaN等新型功率器件对生产制造的工艺流程提出了新的需求和挑战。ICP刻蚀技术作为刻蚀工艺中的一种重要手段,具有刻蚀精度高、均匀性好、污染小、刻蚀形貌易控制等优点,被广泛应用于功率器件的生产制造流程之中。随着刻蚀技术的进度,多种不同的方式得到发展,并应用到新型功率器件制造工艺中。