Symposium
I: Device Engineering and Memory Technology
Symposium Committee
Symposium I: Device Engineering and Memory Technology
• Advanced MOS devices
• Memory devices (DRAM, SRAM, Flash, emerging memory devices)
• Device reliability
• Mobility enhancement technology
• Shallow junction formation
• Source/drain engineering (silicide/salicide)
• RF/HV/Power devices
• Other emerging devices
Symposium Committee
Prof. Ru Huang Chair |
Southeast University , China |
Prof. Cor Claeys Co-Chair |
KU Leuven, Belgium |
Dr. Minhwa Chi Co-Chair |
SiEn (Qingdao) Integrated Circuits Co., China |
Prof. Qianqian Huang Co-Chair |
Peking University, China |
Prof.Gong Xiao Member |
National University of Singapore |
Prof. Ming He Member |
Peking University, China |
Dr. Zongliang Huo Member |
Yangtze Memory Technology Co., Ltd |
Prof. Mario Lanza Member |
National University of Singapore |
Prof. Han Li Member |
Southeast Univeristy, China |
Prof. Jun-wei Luo Member |
Institute of Semiconductors, CAS |
Dr. Wensheng Qian Member |
HHGrace, China |
Dr. Huiling Shang Member |
TSMC |
Prof. Xinran Wang Member |
Nanjing University, China |
Dr. Zhiqiang Wei Member |
Avalanche Technology |
Prof. Huaqiang Wu Member |
Tsinghua University |
Prof. Yuchao Yang Member |
Peking University, China |
Dr. Frank Bin Yang Member |
Qualcomm, USA |
Prof. Bin Yu Member |
Zhejiang Univeristy, China |
Dr. Lijie Zhang Member |
Semiconductor Technology Innovation Center (Beijing) Corp. |
Prof. Peng Zhou Member |
Fudan Univeristy, China |
Symposium I: Device Engineering and Memory Technology
• Advanced MOS devices
• Memory devices (DRAM, SRAM, Flash, emerging memory devices)
• Device reliability
• Mobility enhancement technology
• Shallow junction formation
• Source/drain engineering (silicide/salicide)
• RF/HV/Power devices
• Other emerging devices